Low-temperature ion beam sputtered optical coatings

T. Gischkat^1,*, D. Schachtler¹, F. Steger¹, Z. Balogh-Michels¹, B. Vetsch², T. Strüning³, J. Birkhölzer³, M. Michler³, Ch. Mühlig^4,5, S. Schwinde⁵, M. Trost⁵, S. Schröder⁵, A. Borzi⁶, A. Neels⁶

Published: February 8, 2023

In thin film deposition processes, the lower limit of the deposition temperature is determined by the used coating technology and the duration of the coating process and is usually higher than room temperature. Hence, the processing of thermally sensitive materials and the adjustability of thin film morphology are limited. In consequence, for factual low-temperature deposition processes, an active cooling of the substrate is required. The effect of low substrate temperature on thin film properties during ion beam sputtering was investigated. The SiO₂ and Ta₂O₅ films grown at 0°C show a trend of lower optical losses and higher laser induced damage threshold (LIDT) compared to 100°C.

¹RhySearch, Werdenbergstr. 4, 9471 Buchs, Switzerland
²ThermodynamX, Straubstrasse 11, 7323 Vilters-Wangs, Switzerland 
³OST—University of Applied Sciences Buchs, Werdenbergstr. 4, 9471 Buchs, Switzerland 
⁴Leibniz-IPHT, Albert-Einstein-Str. 9, 07745 Jena, Germany 
⁵Fraunhofer IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany 
⁶Empa, Üeberlandstrasse 129, 8600 Dübendorf, Switzerland 
*Corresponding author: thomas.gischkat(at)iof.fraunhofer.de

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