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At RhySearch, Dual Ion Beam Sputtering (DIBS) is the central technology for manufacturing high-quality optical multi-layer coatings. DIBS has emerged as a benchmark process for fabricating optical thin films with ultra-low loss, near-bulk density, and long-term stability. Building on conventional Ion Beam Sputtering (IBS), DIBS adds a second, independently controlled ion source directed at the substrate. This decouples the generation of material flux from surface energetics: while the primary beam defines the sputter yield and stoichiometry from the target, the assist beam tailors adatom mobility, densification, interface sharpness, and film stress in situ. The result is a compact, void-free microstructure with exceptionally smooth surfaces and highly stable refractive indices—properties that are critical for high-finesse mirrors, narrowband filters, and high-power laser optics.

A central advantage of DIBS is its low thermal budget. Because the necessary growth energy is provided locally by ions, coating can be performed close to room temperature, enabling substrates and assemblies that are incompatible with high-temperature CVD routes. At the same time, precise control of ion energy, current density, and reactive gas dosing supports fully oxidized or nitrided compounds with ppm-level absorption and minimal scatter. These capabilities make DIBS not only a production workhorse for precision optics but also a flexible platform for process  research, including stress balancing, interface engineering, and advanced multilayer design.

This white paper is organized as follows. Section 2 situates DIBS within the broader landscape of optical-coating deposition methods. Section 3 explains the operating principles of IBS and DIBS and outlines practical system configurations. Section 4 provides a hands-on guide to sample preparation and loading for reproducible results. Section 5 presents a RhySearch development on dust-repellent coatings.

Autor: Dr. Matthias Golling
Mitautoren: Dr. Maryam Nazari, Rico Benz, Heidi Thomé

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